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TOCHA

Developing the next generation of topological devices and architectures in which information can flow without losses

TOCHA will introduce a new generation of topological devices by combining topological insulators and ferromagnetic materials.

MAIN THEMES:

Nanotech & Materials

TOPICS:

electronicstopological insulators

COORDINATING ORGANISATION:

Catalan Institute of Nanoscience and Nanotechnology

WEBSITE:

tocha-project.eu/

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About FETFX project — Privacy notice

This project has received funding from the European Union’s Horizon 2020 FET Programme under grant agreement No. 824753.

«Nothing in the world is more exciting than a moment of sudden discovery or invention»

BERTRAND RUSSELL

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